NNT 2024 NILindustrialday program page
You can find the download link for the abstract booklet, an overview of the program plus a list of all contributions here.
Abstract Booklet:
You can download the abstract booklet here.
Program Overview:
MONDAY JUNE 24, 2024:
Starting at 14:00 registration will be open. At 16:00 there will be a tutorial session entitled “Nanoimprint and Applications – Everything you always wanted to know about nanoimprint (but were afraid to ask)” by Helmut Schift and Michael Mühlberger. It will cover a discussion of important NIL technologies as well as an overview of industrial application. Those of you who like to participate in this tutorial, please register directly by email to Helmut Schift (helmut.schift@psi.ch).
At 18:00 there will be a pre-conference get-together at the conference site, with the opportunity to explore the city center of Lund on an individual basis afterwards. You can find information regarding public transportation in Lund here: how to get to the venue
TUESDAY JUNE 25, 2024:
WEDNESDAY JUNE 26, 2024:
THURSDAY JUNE 27, 2024:
POSTERS:
Posters should be DIN A0 portrait mode in size. Posters will be on display during the whole conference. Two poster sessions are planned: Poster Session 1 on Tuesday evening and Poster Session 2 on Thursday morning.
List of all contribution
Monday, June 24
time | speaker | title | |
---|---|---|---|
14:00 | registration opens | ||
16:00 | H. Schift, M. Mühlberger | Tutorial: Nanoimprint and Applications – Everything you always wanted to know about nanoimprint * (* but were afraid to ask) |
|
18:00 | pre-conference get-together |
Tuesday, June 25
Time | Talk Number | Speaker | Affiliation | Title |
---|---|---|---|---|
09:00 | Soft opening, registration, setting up of exhibition and posters coffee, light snacks Company tour 1 (09:30 – 11:00) |
|||
11:00 | LIGHT LUNCH, EXHIBITION | |||
11:30 | Welcome and Opening | |||
11:45 | Anders Mikkelsen | NanoLund, Lund University | Bright future of nanotechnology in Lund | |
12:00 | 1.1 | Ursula Palfinger | Joanneum | Seamless stitching by step&repeat UV imprint lithography for R2R and R2P tooling |
12:20 | 1.2 | Jin Choi | Canon Nanotechnologies Inc. | Nanoimprint Lithography: Market Spaces and Opportunities |
12:40 | 1.3 | Martin Eibelhuber | EV Group | Unlocking the potential of Nanoimprint Lithography for Manufacturing |
13:00 | 1.4 | Steven Chou | Princeton University | Fourier Nanoimprint Patterning for Generating Large-Area, Complex Nanostructures Without Direct-Write |
13:20 | BREAK 40 min, EXHIBITION | |||
14:00 | 2.1 | Jun Taniguchi | Tokyo University of Science | Fabrication of moth-eye-structured roll mold and application of moth-eye-structured film |
14:20 | 2.2 | Hubert Teyssedre | Applied Materials | Enabling High Performance Smart Glasses Using Nanoimprint Lithography |
14:35 | 2.3 | Jan Stensborg | Stensborg A/S | Roll-to-Roll nanoimprint lithography of disposable templates for difficult-to-process materials |
14:50 | 2.4 | Gang Luo | Suzhou New Dimension Nano Technologies | Development of a full ecological NIL industrial platform |
15:05 | 2.5 | Toralf Scharf | Focuslight | Focuslight Imprint Overview |
15:20 | BREAK 40 min, EXHIBITION | |||
16:00 | 3.1 | Mohammad Ramezani | teranova | Scatterometry with nanometer sensitivity for non-destructive quality inspection of gratings and thin films |
16:15 | 3.2 | Hans Hsiao | Himax Technologies | Himax WLO technologies and application introduction |
16:30 | 3.3 | Teck Lee “Jordan” Chee | Moveon | Development of a Novel 3D Inkjet Printing Technique for Embedded Ophthalmic Waveguides for AR & MR Related Applications |
16:45 | 3.4 | Ilja Czolkos | NILT | Metaoptics, Elements and Modules, Produced by Nanoimprint Lithography and Dry Etching |
17:00 | 3.5 | Matthew C. Traub | IMEC | Nanoimprint-Based Patterning of High-Index Dielectrics on 300 mm Transparent Substrates |
17:15 – 18:45 | POSTER SESSION 1, EXHIBITION, 1h 30min | |||
Social event Tuesday |
Wednesday, June 26
Time | Talk Number | Speaker | Affiliation | Title |
---|---|---|---|---|
08:30 | COFFEE, EXHIBITION | |||
09:00 | 4.1 | Jost Göttert | University of Applied Sciences Niederrhein | How Machine Learning will revolutionize Nanoimprint Lithography |
09:30 | BREAK 15min | |||
09:45 | 5.1 | Jim Watkins | University of Massachusetts Amherst | Additive, full-wafer fabrication of all-inorganic metalenses, waveguides, diffractive optics and anti-reflection coatings via direct nanoimprint lithography |
10:05 | 5.2 | Chau Ha | Addison Clear Wave Coatings | High Refractive Index Imprint Resins for UV-NIL for Augmented Reality Optical Devices |
10:20 | 5.3 | Peter Guschl | Pixelligent | Large Process Window High-Refractive Index PixNIL® Formulations for Extended Reality Applications |
10:35 | 5.4 | Stephan Prinz | DELO | Highly reliable polymer resins for permanent imprint of micro-optical elements |
10:50 | 5.5 | Kazumi Yamauchi | NTT | UV imprintable high refractive index resins for optical elements |
11:05 | 5.6 | Keiko Munechika | High RI optics | Filler-less & NIL Compatible Ultra-High Refractive Index Optical Polymers for Photonic Applications |
11:20 | BREAK, EXHIBITION, 25min | |||
11:45 | 6.1 | Mirko Lohse | MRT | Remember the past and prepare the future: 25 years of NIL innovations and challenges in material development |
12:00 | 6.2 | Taigo Akasaki | Toyo Gosei | Durability evaluation of repeated imprint using working stamp: influence of productivity |
12:15 | 6.3 | Mikko Poutanen | inkron | High refractive index nanoimprint resins for inkjetting as enablers of new designs for diffractive waveguides |
12:30 | 6.4 | Mandy Göring | scia Systems | The Future of Augmented Reality: How Ion Beam Processing Improves Slanted Surface Relief Grating (SRG) Manufacturing |
12:45 | 6.5 | Danielle van der Heijden | Morphotonics | Advancing towards higher contrast, energy-efficient screens with advanced anti-glare manufacturing technology |
13:00 | 6.6 | Simon Drieschner | SÜSS | Advancing Inkjet Printing Technologies: Improving Residual Layer Uniformity for Imprinted AR Waveguides |
13:15 | LUNCH BREAK, EXHIBITION, 1h 15min | |||
14:30 | 7.1 | Toshiki Ito | Canon Inc., Semiconductor Production Equipment Group | Defect Reduction in UV Nanoimprint Lithography |
14:50 | 7.2 | David Grosso | Center for Interdisciplinary for Nanoscience of Marseille | Soft-Nano-Imprint-Lithography for Tunable Optical Metasurfaces: From Passive to Active Photonic Components |
15:05 | 7.3 | Massimo Tormen | Germanlitho | Electronic structure of pulsed thermal NIL stamps |
15:20 | 7.4 | Mikhail Omelyanovich | Dispelix | Study of soft working stamp imprint repeatability in nanoimprint lithography replication process |
15:35 | 7.5 | Yoshihiko Hirai | Osaka Metropolitan University | Mold Release Mechanisms, from Fracture Mechanics to Molecular Dynamics |
15:50 | BREAK, EXHIBITION, 40min | |||
16:30 | 8.1 | Marc Verschuuren | SCIL nanoimprint solutions | Accurate front-to-back overlay aligned and directly imprinted slanted gratings using SCIL nanotechnology |
16:45 | 8.2 | Bríd Connolly | Toppan | Advanced 3D patterning for Nanoimprint Masters |
17:00 | 8.3 | Michael Haslinger | Profactor | Nanoimprint based transfer printing of daisy chain chips and integration trough inkjet wire bonding |
17:15 | 8.4 | Berke Erbas | EPFL | Grayscale nanoimprint lithography stamps patterned by thermal scanning probe-based patterning |
17:30 | BREAK, EXHIBITION, 30min | |||
18:00 | Roundtable Panelists: Ramon Compaño (JRC), Babak Heidari (OpTool), Clivia Sotomayor Torres (INL), Jouni Ahopelto (VTT), Patrik Lundstrom (Obducat), Irene Fernandez-Cuesta (Hamburg University), Dirk Bruggeman (private), Lou Gang (ND Nano) Title: Past, Present and Future of Nanoimprinting Moderators: Gabi Grützner (microresist) and Lars Montelius (Lund University) |
|||
19:00 | Conference banquet |
Thursday, June 27
Time | Talk Number | Speaker | Affiliation | Title |
---|---|---|---|---|
08:30 | COFFEE, EXHIBITION | |||
09:00 | 9.1 | Celestino Padeste | PSI | Fabrication of Polymer Support for Serial Protein Crystallography using Thermal Imprint Technologies |
09:20 | 9.2 | Irene Fernandez-Cuesta | University Hamburg | Nanoimprinted devices for biomedical applications |
09:35 | 9.3 | Kenji Fukuzawa | Nagoya University | Viscosity measurement of UV curable resist confined in nanometer gaps using vertical-objective-type ellipsometric microscopy |
09:50 | 9.4 | Yuyan Liu | DTU | Large Scale Replication of Micro-structured Polymeric Surfaces for Marine Bacterial Growth |
10:05 | 9.5 | Hyunsik Yoon | Seoul National University of Science and Technology | Fabrication of Robust Omniphobic Surfaces by Residue-Free Nanoimprint Lithography |
10:20 | POSTER SESSION 2, EXHIBITION, 1h 10min | |||
11:30 | 10.1 | L. Jay Guo | University of Michigan | Nanoimprint for photonics: waveguide, resonators and metasurfaces |
11:50 | 10.2 | Muzahir Ali | Chung-Ang University Seoul, Korea | Fabrication of Vitreous Carbon Mold for Precision Glass Molding of Wafer-Scale Optics |
12:05 | 10.3 | Nefeli Dimogerontaki | University of Athens, NCSR Demokritos | Enhanced Radiative cooling through transparent micro-structured polymer film fabricated by UV-Nanoimprint Lithography |
12:20 | 10.4 | Falk Eilenberger | Fraunhofer IOF, Jena | Scaling Micro- and Nanophotonics: to the Wafer-Level and Beyond |
12:35 | 10.5 | Steven Chou | Princeton University | Towards celebration of 30 years of nanoimprint lithography |
12:50 | FAREWELL | |||
13:00 | LUNCH BREAK, EXHIBITION | |||
14:00 | Company tour 2 (14:00 – 15:30) |
Posters
Poster Number | Poster Title | Presenter | Affiliation |
---|---|---|---|
P01 | Wetting properties of photocurable liquid films in nanogaps measured using a nanochannel device | Shintaro Itoh | Nagoya University |
P02 | Microstructuring by Fluid FM and NIL to create anti-fouling properties on blood-contacting devices | Marcus Soter | IBA Heiligenstadt |
P03 | Enhancing Nano Imprinting Lithography: An Examination of Step and Repeat Master Cleaning Procedures and Their Impact on Pattern Fidelity | Achleitner Thomas | EV Group |
P04 | Investigation of the Effect of Adhesion Promotors on Layer Formation and Process Stability for Inkjet Printing | Johanna Rimböck | EV Group |
P05 | Fabrication of Anti-icing Functional Surface on an Aluminium Substrate through a Metal Imprinting Process Using Laser Drilled Stainless Steel Mold | Ju Wan Kim | Chung-Ang University Seoul, Korea |
P06 | Glass Imprinted Negative Micro Pyramidal Structure using Vitreous Carbon Mold for Hydrophobic Functional Surface | Su Yeon Seok | Chung-Ang University Seoul, Korea |
P07 | Fabrication of Plasmonic Nanoantenna Array by Nanoimprinting and Physical Vapor Deposition for Enhanced Fluorescence Micro Array Biochip. | Tasadduq Hussain | Chung-Ang University, Seoul |
P08 | High aspect ratio structures in microfluidic channels by UV-nanoimprint lithography | Anja Haase | Joanneum |
P09 | Combining state-of-the-art nano- and microfabrication technologies for rapid prototyping of replication masters | Jan Erjawetz | Xrnanotech |
P10 | Nanostructuring flexible polyimide surfaces with nanoimprint lithography for biointerface applications | Bharat Nowduri | Kaiserslautern University of Applied Sciences |
P11 | Suppressive factors of liquid advancement at mold-substrate nano-gaps in UV nanoimprinting | Masaru Nakagawa | Tohoku University |
P12 | Fabrication of Metasurfaces with different materials using Nanoimprint Technology | Wanjiao Zhang | Hangzhou Institute for Advanced Study |
P13 | UV-Nanoimprinting to Modify 3D-Printed Ceramic Surfaces for Life Science Applications | Sonja Kopp | PROFACTOR GmbH |
P14 | The Influence of Surface Microstructures on the Interaction with Blood for the Use in a Left Ventricular Assist Device | Sonja Kopp | PROFACTOR GmbH |
P15 | Nanoimprinting of functional materials for life science applications | Michael Mühlberger | PROFACTOR GmbH |
P16 | Nanoimprint and Sustainability | Helmut Schift | PSI |
P17 | Room temperature imprinting followed by sintering of phosphate glass based microparticle inks towards glass microfluidic chip | Muhammad Refatul Haq | PSI |
P18 | Joint nanoimprint and injection molding expertise for micro- and nano-optics | Juan Jiminez | Sony DADC |
P19 | Fabrication and processing of transparent and flexible conductive electrodes for Smart Window applications | Michael Haslinger | PROFACTOR GmbH |
P20 | Inkjet Deposition of Refractive index Engineered Materials for Nanoimprinted Waveguides | Michael Haslinger | PROFACTOR GmbH |
P21 | Impact of NanoImprint process on Grayscale resist master for 3D patterning | Api Warsono | Univ. Grenoble Alpes, CEA, LETI |
P22 | NanoFrazor Technology: A New Grayscale Patterning Tool for Nanoimprint Lithography | Fei Yang | Heidelberg Instruments Mikrotechnik GmbH |
P23 | High-Throughput and Reproducible Fabrication of Metasurfaces and SERS Platforms using UV-NIL and Bosch Deep Reactive Ion Etching | Jesil Jose | SINTEF |