We are excited to spread the first save-the-date notification for this year’s NIL INDUSTRIAL DAY 2021! The leading summit for Nanoimprint Lithography and its applications will be held in its 11th anniversary edition in a virtual format, on June 22nd – 23rd 2021.
The program is currently advancing in great steps and we proudly announce an exciting selection of confirmed industrial-user contributions from around the globe:
- 5microns (Germany)
- AMO (Germany)
- Anteryon (Netherlands)
- Dispelix Oy (Finland)
- EV Group (Austria)
- Facebook (USA)
- GENSPEED Biotech (Austria)
- imec (Belgium)
- Leia Inc. (USA)
- NIL Technology ApS (Denmark)
- Monash University (Australia)
- Moveon Technologies Pte Ltd. (Singapore)
- SCIVAX (Japan)
- Smart Material Solutions (USA)
- SÜSS MicroTec (Germany)
