Speakers at the NILindustrialday 2016
Confirmed plenary speakers are:
Stephen Chou, Princeton University – 20 Years of Nanoimprint
Iris Bergmair, Sony DADC – Microfluidic cartridge for the new generation of rapid and cost-effective diagnostic biomarker analysis
Remco van Brakel, Philips Group Innovation, Intellectual Property & Standard – 2.5D imprinting with SCIL
Hubert Brückl, Donau-Universität Krems – Magnetic Lab-on-a-Bead
Karen Chong, A*STAR’s Institute of Materials Research and Engineering (IMRE) – Nanoimprinting and Nanoinjection Molding – Accessing Nanoscale On Three-Dimensional Free-Form Products
Dominique Colle, Heidelberg Instruments – Advanced Optimization Method for Grayscale Direct Lithography
Jakub Dostalek, AIT-Austrian Institute of Technology – Plasmonically enhanced fluorescence biosensors
Markus Guttmann, Karlsruhe Institute of Technology Institute of Microstructure Technology – Novel fabrication process for free-formed mold inserts in steel nanostructured by imprint lithography and nickel up-plating
Babak Heidari, Obducat – Industrial use of NanoImprint in Life Science
Felix Holzner, SwissLitho – 3D stamp fabrication with 1 nm vertical resolution using the NanoFrazor
Steffen Howitz, GeSiM GmbH – µCP4.1 – platform for the automated contact printing and nano-imprint lithgraphy process
Mikko Karppinen, VTT TECHNICAL RESEARCH CENTRE OF FINLAND – Imprinted polymer waveguides and integrated optics for photonic interconnects and sensors
Anders Kristensen, Technical University of Denmark – Nanoimprinted plasmonic color metasurfaces for flexible decoration of plastic consumer products
Guggi Kofod, Inmold A/S– Durable nanostructured tools for plastic injection moulding
Stefan Köstler, Joanneum Research – Roll-to-Roll pilot line for large-scale manufacturing of microfluidic devices
Stéfan Landis, CEA – Commissariat à l’énergie atomique et aux énergies alternatives – NIL industrial platform assessment within INSPIRE
Y.C. Lee, Natl. Cheng-Kung University Taiwan – Soft Photomask Lithography for Manufacturing Patterned Sapphire Substrate (PSS) in LED Industry
Heon Lee, Korea University – Fabrication of functional nano-structures using nanoimprint lithography for highly efficient optoelectronic devices
Lars Lindvold, Stensborg – Dark reactions in photopolymers
Hong Yee Low, Singapore University – Nanoimprinting on Curve Substrate via an Elastic Bilayer Mold
Keiko Munechika, aBeam Technologies – Imprinting of High Refracive Index Material for Optical Applications
Theodor Nielsen, NIL Technology ApS – To be announced
Marc Papenheim, University of Wuppertal – Flat, highly flexible composite stamp for nanoimprint
Mathias Rommel , Fraunhofer Institute for Integrated Systems and Device Technology IISB – Stamps for nanoimprint lithography: R&D at Fraunhofer IISB
Thomas Ruhl, temicon GmbH – Production capabilities for seamless micro- and nanostructured sleeves used for Roll-2-Roll processes
Helmut Schift, Paul Scherrer Institut – Diamond like carbon (DLC) leaky waveguide sensors using a simplified SiPol transfer process
Marco Vogler, micro resist technology – Functional Imprint Materials for Industrial Manufacturing of Micro Optics and Complex 3D Patterns
Mads Rostgaard Sonne, Technical University of Denmark – Modelling the flexible stamp deformations during NIL on curved surfaces
Barbara Stadlober, Joanneum Research – Materials – Advanced micro- and nanomanufacturing of large area organic electronics and functional surfaces
Marc Verschurren, Philips Group Innovation, Intellectual Property & Standards– SCIL Nanoimprint Solutions; high volume soft NIL
James Watkins, University of Massachusetts Amherst – Direct Imprinting 2-D and 3-D Nanoparticle/Polymer Hybrid and Crystalline Metal Oxide Structures for Optical, Electronic, and Energy Devices
Harald Zaglmayr, EVG Group – Transition of NIL to high volume manufacturing