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Dear participants of this year’s combined NNT and NIL-ID,

We, the organizers, hereby like to say a BIG THANK YOU to you all. We gathered about 210 people and 34 exhibitors from the international eco-system related to nanoimprinting and nanoprinting lithographies.

Thanks a ton for coming to the conference!

We are looking forward to meeting you all again. For instance, at the next NNT 2025 conference in California – celebrating 30 years of NIL – as well as at the next NIL-ID conference in Austria, or elsewhere…..

All the very best! And see you soon again!

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We are delighted that number of confirmed exhibitors are exceeding expectations. Those companies that have not yet registered, please contact Lars Montelius for checking further possibilities of arrangements.

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Dear partners

This is an update of our upcoming premier conference, the united NNT & NIL ID conference, to be held in Lund on June 24-27 2024. We are extremely happy to be able to announce a full suite of participating exhibitors and conference delegates. This will indeed be a unique opportunity to meet and discuss with the most important players in the Nanoimprint, nanoprinting and nanolithography ecosystem.

We gratefully acknowledge the exhibiting companies already supporting the united conference:
AUTEX, EV Group, GDNano, German Litho, Heidelberg Instruments, Heteromerge, HighRI Optics, Inkron, Joanneum Research, NDNANO, Nanoscribe, NILT, micro resist technology, Morphotonics, Myrias Optics, Obducat, Optool, Profactor, Raith, Scivax, SCIL and Stensborg.

Those companies that have not yet registered, please do so asap to secure your exhibition space.

Further, we have a great number of confirmed invited speaker for industrial user presentations. Lately, we received a significant number of relevant technical abstracts (from both, academia and industry), covering most important topics of NIL. The detailed conference program is now underway and will soon be finalized, but the preview list of selected contribution can be seen here: https://www.nil-industrialday.org/speakers-2024/

Due to postponements in the past, we will continue to accept abstracts as late submissions. There is maybe a chance to also include some late submissions in the technical program, although the majority will be posters.
We will have a tutorial session on Monday afternoon, they will cover a discussion of important NIL technologies as well as an overview of industrial application. Those of you who like to participate in these tutorials, please register directly by email to Helmut Schift (helmut.schift@psi.ch).

If you that have not yet signed up – please register as soon as possible! We do have some space limitations, so do not wait until last minute. The early bird rate is still valid (until May 31).

We wish you all very warm welcome to an extremely interesting NNT (2024) NIL- ID conference and, of course, to the beautiful, picturesque city of Lund, Sweden.

Conference Chairs
Lars & Arne

Program Chairs
Helmut & Michael

Abstract submission deadline April 5, 2024

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The abstract deadline for NNT 2024 has been shifted and is now April 5, 2024.
We invite you to submit nanoimprint related abstracts covering processes or applications.

The maximum abstract length is two-pages. The first page should contain text and references. The second page should contain figures, images, data tables etc. as needed. Please use the MS Word template to prepare the abstract.

Abstracts may be submitted as pdf files by sending them to abstracts-nnt2024@nil-industrialday.org. Please include the full name, e-mail and affiliation of the corresponding author in your e-mail.

You will be notified of the decision around the beginning of May by e-mail.

The program, including a link to your abstract document (pdf), will be published on the webpage. An electronic abstract booklet will be compiled.

Looking forward to your contributions,

Helmut Schift and Michael Mühlberger
NNT2024 Program Chairs

NNT 2024 & NIL Industrial Day – June 24-27, 2024, Lund, Sweden

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NNT (2024) & NIL Industrial Day
– June 24-27, 2024, Lund, Sweden –

Nanoimprint lithography has developed from an academic pioneering research work to an industrial relevant and diverse fabrication technology within the last three decades resulting in an ever growing relevance in academia and industry.

Hence, we are very happy to announce that this year, 2024, we will welcome you to take part of an extraordinary, unique ground-breaking and first of its kind Nanoimprint technology event, namely the merge of the two most reputed conferences related to Nanoimprint and Nano-printing, the International NNT conference and the European NIL Industrial Day.

We are convinced that in 2024 we have a unique opportunity to foster a very strong world-wide NIL eco-system by combining both events and thus enhance the two conferences strong merits.

 

This merged conference will honor the remembrance of the world’s first international Nanoimprint workshop that was held in Lund 2000. That Lund NIL workshop, the first of its kind, was indeed the igniting step to the establishment of the international NNT conference series, celebrating the existence of 25 years in 2025. Further, it paved the ground for a series of EU supported European Projects within the NIL area, which in turn fostered the creation of a strong and large European-wide industrial eco-system, e.g. represented by the launch of the NIL Industrial Day out of the projects NaPa and NaPaNIL.

The merge of the NNT 2024, the 23rd International Conference on Nanoimprint and Nanoprint Technologies, and the European NIL Industrial Day 2024, the 14th summit focusing on industrial applications of Nanoimprint Lithography, will surely become the world’s leading symposium on nanoimprint and nanoprint to come in 2024.

Hence, we are extremely happy to wish you a warm welcome to the combined NNT (2024) NIL ID conference, to be held June 24-27, 2024, at ”The Medicon Village”, Lund, Sweden.

More information will follow shortly!

Conference Chairs: Lars Montelius, LU & Arne Schleunitz, MRT
Program Chairs: Helmut Schift, PSI & Michael Mühlberger, PRO