Selection of Contributions
We gladly announce a selection of confirmed industrial and academic speakers and relevant conference contributions (affiliation in alphabetical order). The detailed program will be available soon:
- Applied Materials … Hubert Teyssedre
- Canon … Toshiki Ito
- CINaM / Solnil … David Grosso
- DELO … Stephan Prinz
- Dispelix … Mikhail Omelvanovich
- EPFL … Berke Erbas
- EVG … Thomas Glinsner
- Focuslight … Toralf Scharf
- GermanLitho … Massimo Tormen
- Heidelberg Instruments Mikrotechnik GmbH … Fei Yang
- HIMAX … Hans Hsiao
- Hochschule Niederrhein … Jost Göttert
- Holographix … Jesse Van Ven Roy
- IMEC … Matthew C. Traub
- Inkron Oy … Mikko Poutanen
- Joanneum Research … Ursula Palfinger
- micro resist technology … Mirko Lohse
- Morphotonics … Danielle van der Heijden
- Moxtek … Brad Williams
- Moveon … Teck Lee “Jordan” Chee
- NIL Technology … Ilja Czolkos
- NTT AT … Kazumi Yamauchi
- Paul Scherrer Institute … Celestino Padeste
- Pixelligent … Peter Guschl
- Princeton University … Stephen Chou
- Profactor … Michael Haslinger
- scia systems – Marcel Demmler
- SCIL Nanoimprint Solutions … Marc Verschuuren
- Sony DADC – Juan Jimenez
- Stensborg A/S … Jan Stensborg
- SUSS MicroTec … Simon Drieschner
- TeraNova … Mohammad Ramezani
- Tokyo University of Science … Jun Taniguchi
- TOPPAN … Bríd Connolly
- Toyo Gosei … Taigo Akasaki
- University of Massachusetts Amherst … James Watkins
- University of Michigan … L. Jay Guo
- XRnanotech … Jan Erjawetz
- ….